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(semiconductor)
I N T E R O F F I C E M E M O
To: FAB6 CMP Date: 4/04/97
cc: From: Timothy P. Dyer
Dept: CMP Engineering
Ext: 5072
Node: YIELD::TDyer
Lock/Mail Stop: HLO1-1/p-11
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METAL CMP PD
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CMP.D1-7 - Start up in progress. GFI breaker replaced today. NOTOUCH mini-
marathon ran today. The Auriga ran at 103w/h,,,,,,yes 103 wafers
per hour.
CMP.D1 WILL REMAIN IN WET MODE THROUGH THE WEEKEND. DO NOT TOUCH THIS
SYSTEM, SOFTWARE OR HARDWARE. IF THERE IS A PROBLEM, LEAK ETC, POWER
THE SYSTEM DOWN.
CMP.C1-7 - UP. After battling alignments, configuration and leak problems
most of the week. MQCS were checked on the W-CMP process and are in
spec. The 2nd table oxide process will be verified on Monday.
THE SNOW IS MELTING................... :)
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